说明
RESIST CLEAN, CU配置
无配置OEM 型号描述
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.文件
无文件
LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2130
已验证
类别
Ashers / Plasma Cleaner
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
101694
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2130
类别
Ashers / Plasma Cleaner
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
101694
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
RESIST CLEAN, CU配置
无配置OEM 型号描述
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.文件
无文件