说明
Single Block (Resist Coater/Developer)配置
Tool is operating in clean room. Labelled as LEASE. Buyer will be responsible for arranging disassembly and rigging for tool. BLOCK DIAGRAM: Please see. Additional configurations will be provided. Pictures will be collected. Missing or damaged parts: Not reported. Please inspect to confirm.OEM 型号描述
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.文件
无文件
TEL / TOKYO ELECTRON
ACT 12
已验证
类别
Coaters & Developers
上次验证: 19 天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
21309
晶圆尺寸:
12"/300mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
查看全部TEL / TOKYO ELECTRON
ACT 12
类别
Coaters & Developers
上次验证: 19 天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
21309
晶圆尺寸:
12"/300mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Single Block (Resist Coater/Developer)配置
Tool is operating in clean room. Labelled as LEASE. Buyer will be responsible for arranging disassembly and rigging for tool. BLOCK DIAGRAM: Please see. Additional configurations will be provided. Pictures will be collected. Missing or damaged parts: Not reported. Please inspect to confirm.OEM 型号描述
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.文件
无文件