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KLA AIT I
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
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    KLA

    AIT I

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    已验证

    类别
    Defect Inspection

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    60463


    晶圆尺寸:

    8"/200mm


    年份:

    1997

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    KLA AIT I

    KLA

    AIT I

    Defect Inspection
    年份: 2008状况: 翻新
    上次验证60 多天前

    KLA

    AIT I

    verified-listing-icon
    已验证
    类别
    Defect Inspection
    上次验证: 60 多天前
    listing-photo-d2072196ad404c639260bfeef4dff980-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/60463/0073d4d0028046ff9c85f13d146d36c6_21376f7c537b4a0bb5c7adff88815624image138scaled_mw.jpeg
    listing-photo-d2072196ad404c639260bfeef4dff980-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/60463/14a74dfbc552477ba0543b7206406286_0ff0d7aa20494a0a9bc5c867a6c0f07aimage139scaled_mw.jpeg
    listing-photo-d2072196ad404c639260bfeef4dff980-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1689/60463/8e8fd926b8ee41eba38c1a1bb451da5b_dfa26cb813bd4c6983d010663721517eimage140scaled_mw.jpeg
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    60463


    晶圆尺寸:

    8"/200mm


    年份:

    1997


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
    文件

    无文件

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