说明
Polysilicon Etch配置
无配置OEM 型号描述
Two new etch systems were launched in 1996 for HDP etching of metal and silicon films, using AMAT's DPS (Decoupled Plasma Source) technology. The DPS Metal Etch Centura and DPS Silicon Etch Centura are aimed at very advanced applications, primarily for deep submicron devices (0.25-micron).文件
无文件
APPLIED MATERIALS (AMAT)
CENTURA METAL DPS
已验证
类别
Dry / Plasma Etch
上次验证： 6 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
94809
晶圆尺寸：
12"/300mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA METAL DPS
类别
Dry / Plasma Etch
上次验证： 6 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
94809
晶圆尺寸：
12"/300mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Polysilicon Etch配置
无配置OEM 型号描述
Two new etch systems were launched in 1996 for HDP etching of metal and silicon films, using AMAT's DPS (Decoupled Plasma Source) technology. The DPS Metal Etch Centura and DPS Silicon Etch Centura are aimed at very advanced applications, primarily for deep submicron devices (0.25-micron).文件
无文件