说明
Dry etching Including: EBARA GTE-0-2 dry scrubber, EBARA GTE-3-0 dry scrubber, Endpoint, Chiller (SCS 2WHA), Pump (A30W-N), Gas box. Missing parts: TC gauge circuit board, RF Generator* 1 piece.配置
PolyOEM 型号描述
The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.文件
无文件
类别
Dry / Plasma Etch
上次验证： 昨天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
139260
晶圆尺寸：
6"/150mm
年份：
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
P5000 ETCH
类别
Dry / Plasma Etch
上次验证： 昨天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
139260
晶圆尺寸：
6"/150mm
年份：
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Dry etching Including: EBARA GTE-0-2 dry scrubber, EBARA GTE-3-0 dry scrubber, Endpoint, Chiller (SCS 2WHA), Pump (A30W-N), Gas box. Missing parts: TC gauge circuit board, RF Generator* 1 piece.配置
PolyOEM 型号描述
The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.文件
无文件