说明
Thickness Measurement配置
无配置OEM 型号描述
FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.文件
无文件
ONTO / RUDOLPH / AUGUST
FOCUS FE VII
已验证
类别
Elipsometry
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
65963
晶圆尺寸:
8"/200mm
年份:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
查看全部ONTO / RUDOLPH / AUGUST
FOCUS FE VII
类别
Elipsometry
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
65963
晶圆尺寸:
8"/200mm
年份:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Thickness Measurement配置
无配置OEM 型号描述
FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.文件
无文件