说明
无说明配置
无配置OEM 型号描述
FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.文件
无文件
ONTO / RUDOLPH / AUGUST
FOCUS FE VII
已验证
类别
Elipsometry
上次验证： 14 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
118425
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ONTO / RUDOLPH / AUGUST
FOCUS FE VII
类别
Elipsometry
上次验证： 14 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
118425
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
无配置OEM 型号描述
FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.文件
无文件