说明
无说明配置
-Indium-free 6 sample holders with different profiles -Substrate heater up to 900 C -Substrate manipulator: power supply, temperature controller, and servo motor control unit -Clean chamber and can be used for any materials -All sources are on 2.75” flanges -Effusion cells can be configured as required -Two valved crackers (as required) -Wagon wheel prep chamber has Auger Analysis -Growth chamber pumps: 400 l/m ion pump and 10” cryo pump -Prep chamber pumps: 220 l/m ion pump -Load lock pumps: Sorption, mechanical, and turbo pumps -Three ion gauges and controllers -RHEED and QMS systems -Pyrometer -New software and PC -Bake out panelsOEM 型号描述
未提供文件
无文件
VEECO / APPLIED EPI / VARIAN
GEN II
已验证
类别
Epitaxial deposition (EPI)
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
53873
晶圆尺寸：
2"/50mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
VEECO / APPLIED EPI / VARIAN
GEN II
类别
Epitaxial deposition (EPI)
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
53873
晶圆尺寸：
2"/50mm
年份：
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
-Indium-free 6 sample holders with different profiles -Substrate heater up to 900 C -Substrate manipulator: power supply, temperature controller, and servo motor control unit -Clean chamber and can be used for any materials -All sources are on 2.75” flanges -Effusion cells can be configured as required -Two valved crackers (as required) -Wagon wheel prep chamber has Auger Analysis -Growth chamber pumps: 400 l/m ion pump and 10” cryo pump -Prep chamber pumps: 220 l/m ion pump -Load lock pumps: Sorption, mechanical, and turbo pumps -Three ion gauges and controllers -RHEED and QMS systems -Pyrometer -New software and PC -Bake out panelsOEM 型号描述
未提供文件
无文件