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VEECO / APPLIED EPI / VARIAN GEN II
    说明
    VEECO Gen II MBE Growth system, 3"
    配置
    (10) ports for dopants Process: Growth of arsenides and phosphides Liquid nitrogen Phase separator AlGaAs Laser Room temperature: 6°C - 10°C Vacuum: Growth chamber (GC) Triode ion pump: 400 l/sec Buffer chamber (BC) Triode ion pump: 200 l/sec (2) TSP Controllers Loadlock chamber (LC) (100) CTI Cryotor cryopumps (2) Vacshorption pumps Ventury pump In situ and calibration tools: RHEED System: 0-10 keV RHEED Oscillation growth rate calibration system Cells: EPI Valved cracker with valved controller Cable Riber three zone P Valved cracker with valve controller Power supply (4) 400g Sumo cells Ga, In, Al (2) Dopont cells Dual electronic equipment rack, 19" (12) Solenson DC power supplies Riber P valved cracker 2704 Dual channel Eurotherm controller Substrate and heated station (2) DC Power supplies Substrate heater Heated station
    OEM 型号描述
    未提供
    文件

    无文件

    verified-listing-icon

    已验证

    类别
    Epitaxial deposition (EPI)

    上次验证: 12 天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    145622


    晶圆尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    VEECO / APPLIED EPI / VARIAN GEN II

    VEECO / APPLIED EPI / VARIAN

    GEN II

    Epitaxial deposition (EPI)
    年份: 2004状况: 二手
    上次验证12 天前

    VEECO / APPLIED EPI / VARIAN

    GEN II

    verified-listing-icon
    已验证
    类别
    Epitaxial deposition (EPI)
    上次验证: 12 天前
    listing-photo-0b7cfe8258f24712881180c66f70d546-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    145622


    晶圆尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    VEECO Gen II MBE Growth system, 3"
    配置
    (10) ports for dopants Process: Growth of arsenides and phosphides Liquid nitrogen Phase separator AlGaAs Laser Room temperature: 6°C - 10°C Vacuum: Growth chamber (GC) Triode ion pump: 400 l/sec Buffer chamber (BC) Triode ion pump: 200 l/sec (2) TSP Controllers Loadlock chamber (LC) (100) CTI Cryotor cryopumps (2) Vacshorption pumps Ventury pump In situ and calibration tools: RHEED System: 0-10 keV RHEED Oscillation growth rate calibration system Cells: EPI Valved cracker with valved controller Cable Riber three zone P Valved cracker with valve controller Power supply (4) 400g Sumo cells Ga, In, Al (2) Dopont cells Dual electronic equipment rack, 19" (12) Solenson DC power supplies Riber P valved cracker 2704 Dual channel Eurotherm controller Substrate and heated station (2) DC Power supplies Substrate heater Heated station
    OEM 型号描述
    未提供
    文件

    无文件

    类似上架物品
    查看全部
    VEECO / APPLIED EPI / VARIAN GEN II

    VEECO / APPLIED EPI / VARIAN

    GEN II

    Epitaxial deposition (EPI)年份: 2004状况: 二手上次验证:12 天前
    VEECO / APPLIED EPI / VARIAN GEN II

    VEECO / APPLIED EPI / VARIAN

    GEN II

    Epitaxial deposition (EPI)年份: 0状况: 二手上次验证:29 天前
    VEECO / APPLIED EPI / VARIAN GEN II

    VEECO / APPLIED EPI / VARIAN

    GEN II

    Epitaxial deposition (EPI)年份: 0状况: 二手上次验证:29 天前