说明
MBE MOD System Three Inch wafer, 8 sources. Indium-free 10 sample holders with different profiles. Substrate heater up to 1000 C. Substrate manipulator: power supply, temperature controller, and servo motor control unit. Clean chamber and can be used for any materials. All sources are on 4.5” flanges. Effusion cells can be configured as required. Two valved crackers (as required). RF plasma source for either nitrogen or oxygen. Growth chamber pumps: 400 l/m ion pump and 10” cryo pump. Prep chamber pumps: 220 l/m ion pump. Load lock pumps: Sorption, mechanical, and turbo pumps. Three ion gauges and controllers. RHEED and QMS systems. Pyrometer. New software and PC. Bake out panels.配置
无配置OEM 型号描述
未提供文件
无文件
类别
Epitaxial deposition (EPI)
上次验证： 9 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
144927
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
VEECO / APPLIED EPI / VARIAN
GEN II
类别
Epitaxial deposition (EPI)
上次验证： 9 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
144927
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
MBE MOD System Three Inch wafer, 8 sources. Indium-free 10 sample holders with different profiles. Substrate heater up to 1000 C. Substrate manipulator: power supply, temperature controller, and servo motor control unit. Clean chamber and can be used for any materials. All sources are on 4.5” flanges. Effusion cells can be configured as required. Two valved crackers (as required). RF plasma source for either nitrogen or oxygen. Growth chamber pumps: 400 l/m ion pump and 10” cryo pump. Prep chamber pumps: 220 l/m ion pump. Load lock pumps: Sorption, mechanical, and turbo pumps. Three ion gauges and controllers. RHEED and QMS systems. Pyrometer. New software and PC. Bake out panels.配置
无配置OEM 型号描述
未提供文件
无文件