说明
General System Layout Main, Utility System Type L-type Side Maintenance Installed System Paint Color Ivory Furnace Front Surface Finish SUS Heater Model VOS-40-017 Rapid Cooling Unit Missing N2 Load Lock - O2 Analyzer Installed/LC750 Cassette I/O Type Normal I/O Type SMIF Maker/Model Not Installed AGV Compatibility Unable System Main Controller WAVES Mechanical Controller - Sequence Controller - Gas Controller - Furnace Temperature Controller - Furnace Over Temp Detector - Host Communications - User Host Computer I/F - Gas Flow Chart Pannel Installed (Front , Rear) Operation Pannel Installed (Front) Signal Tower/Colors Not Installed Gas Detector Maker/Model RIKEN KEIKI Detecting Gas AsH3 Manual (Drawing, Parts list etc. ) Not Included Gas System Process Gas N2, SiH4 Basic Style Integrated Gas System(Fujikin) Manual Valve FUJIKIN Air-Operated Valve FUJIKIN Filter TOSHIBA Regulator VERIFLO MFC Maker/Model UNIT/UFC 1661 PT Sensor Maker/Model MKS DPM Maker/Model MKS Check Valve FUJIKIN Baking System N/A Liquid Source Auto-Refill N/A Burn Controller N/A Vaporizer N/A Vacuum/Exhaust Pump*1 N/A Pressure Control Valve N/A Pressure Controller N/A Pressure Sensor N/A Trap Not Installed Gas Cooler N/A Wafer/Cassette Handling Wafer Type 200 mm Flat-zone Type Auto Wafer Aligner Installed Wafer Qty. in Cassette 26 Cassette Storage Qty. 21 Fork Type 1 + 4 Fork-Wafer Presence Sensor Installed Fork-Variable Pitch Installed Magnetic Seal Rotation Installed配置
Alpha-8SE LPCVD Undoped-polyOEM 型号描述
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.文件
类别
Furnaces / Diffusion
上次验证： 昨天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
138692
晶圆尺寸：
8"/200mm
年份：
2003
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ALPHA-8SE
类别
Furnaces / Diffusion
上次验证： 昨天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
138692
晶圆尺寸：
8"/200mm
年份：
2003
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available