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TEL / TOKYO ELECTRON ALPHA-8SE
    说明
    D-POLY
    配置
    无配置
    OEM 型号描述
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    文件
    verified-listing-icon

    已验证

    类别
    Furnaces / Diffusion

    上次验证: 7 天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    138030


    晶圆尺寸:

    8"/200mm


    年份:

    2004


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion
    年份: 2006状况: 二手
    上次验证7 天前

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    verified-listing-icon
    已验证
    类别
    Furnaces / Diffusion
    上次验证: 7 天前
    listing-photo-7fe024218d6b484b980ffe32dae800de-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1515/7fe024218d6b484b980ffe32dae800de/25c7004eb891490b9f32cb7fcc2776b4_1_mw.png
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    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    138030


    晶圆尺寸:

    8"/200mm


    年份:

    2004


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    D-POLY
    配置
    无配置
    OEM 型号描述
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    文件
    类似上架物品
    查看全部
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion年份: 2006状况: 二手上次验证:7 天前
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion年份: 2003状况: 二手上次验证:昨天
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion年份: 2004状况: 二手上次验证:昨天