说明
无说明配置
Alpha 8SE-Z Software: OS Linux Process: SOD Type: LP-CVD AIR VALVE: FUJIKIN, CKD Heater: "VOS-40-017 3471206Z2164" MFC,MFM: STEC Three phase power: 208V MAIN: CKD Single phase power: 120V APC: CKD GAS: N2,P-N2,O2,H2OEM 型号描述
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.文件
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TEL / TOKYO ELECTRON
ALPHA-8SE
已验证
类别
Furnaces / Diffusion
上次验证： 6 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
116129
晶圆尺寸：
未知
年份：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
ALPHA-8SE
类别
Furnaces / Diffusion
上次验证： 6 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
116129
晶圆尺寸：
未知
年份：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Alpha 8SE-Z Software: OS Linux Process: SOD Type: LP-CVD AIR VALVE: FUJIKIN, CKD Heater: "VOS-40-017 3471206Z2164" MFC,MFM: STEC Three phase power: 208V MAIN: CKD Single phase power: 120V APC: CKD GAS: N2,P-N2,O2,H2OEM 型号描述
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.文件
无文件