说明
Part tool, Heater for the TELFORMULA Working, 3 months warranty配置
P/N: ALT20YS8084 QUARTZ THICKNESS : Type: Average thickness : 7.5mm or more MEASURING METHOD: Digital caliper Dedicated acrylic board (acrylic board)OEM 型号描述
TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.文件
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TEL / TOKYO ELECTRON
TELFORMULA
已验证
类别
Furnaces / Diffusion
上次验证： 30 多天前
物品主要详细信息
状况：
Parts Tool
运行状况:
未知
产品编号：
111400
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
TELFORMULA
类别
Furnaces / Diffusion
上次验证： 30 多天前
物品主要详细信息
状况：
Parts Tool
运行状况:
未知
产品编号：
111400
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Part tool, Heater for the TELFORMULA Working, 3 months warranty配置
P/N: ALT20YS8084 QUARTZ THICKNESS : Type: Average thickness : 7.5mm or more MEASURING METHOD: Digital caliper Dedicated acrylic board (acrylic board)OEM 型号描述
TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.文件
无文件