We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 阅读更多
说明
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: TEL Waves Equipment status: Out of Fab Process: High - K Type: Diffusion Air valve: FUJIKIN Heater: VCM-05-006L (000080470783) MFC, MFM: HORIBA STEC Three phase power: 3Ø AC 400V Single phase power: 1Ø AC 208V Main/APC: CKD Gas: PN2 / O3 / Ar / TEMAH / N2 / OCTANE / TMA Others: KAWASAKI MECHA配置
FORMULA 1S-H Process: High - K The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Temperature controller - Scavenger - Cooling water unit The gas subsystem includes the following major components: - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM 型号描述
TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.文件
无文件
类别
Furnaces / Diffusion
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
72840
晶圆尺寸：
12"/300mm
年份：
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
查看全部
TEL / TOKYO ELECTRON
TELFORMULA
类别
Furnaces / Diffusion
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
72840
晶圆尺寸：
12"/300mm
年份：
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: TEL Waves Equipment status: Out of Fab Process: High - K Type: Diffusion Air valve: FUJIKIN Heater: VCM-05-006L (000080470783) MFC, MFM: HORIBA STEC Three phase power: 3Ø AC 400V Single phase power: 1Ø AC 208V Main/APC: CKD Gas: PN2 / O3 / Ar / TEMAH / N2 / OCTANE / TMA Others: KAWASAKI MECHA配置
FORMULA 1S-H Process: High - K The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Temperature controller - Scavenger - Cooling water unit The gas subsystem includes the following major components: - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM 型号描述
TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.文件
无文件