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TEL / TOKYO ELECTRON TELINDY
    说明
    无说明
    配置
    POLY Detail attached below
    OEM 型号描述
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
    文件

    TEL / TOKYO ELECTRON

    TELINDY

    verified-listing-icon

    已验证

    类别
    Furnaces / Diffusion

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    40463


    晶圆尺寸:

    12"/300mm


    年份:

    2013


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusion
    年份: 2010状况: 二手
    上次验证30 多天前

    TEL / TOKYO ELECTRON

    TELINDY

    verified-listing-icon
    已验证
    类别
    Furnaces / Diffusion
    上次验证: 60 多天前
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    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    40463


    晶圆尺寸:

    12"/300mm


    年份:

    2013


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    POLY Detail attached below
    OEM 型号描述
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
    文件
    类似上架物品
    查看全部
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