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TEL / TOKYO ELECTRON TELINDY
    说明
    FURNACE
    配置
    ALD SiN
    OEM 型号描述
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
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    TEL / TOKYO ELECTRON

    TELINDY

    verified-listing-icon

    已验证

    类别
    Furnaces / Diffusion

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    51955


    晶圆尺寸:

    12"/300mm


    年份:

    2004


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusion
    年份: 2010状况: 二手
    上次验证8 天前

    TEL / TOKYO ELECTRON

    TELINDY

    verified-listing-icon
    已验证
    类别
    Furnaces / Diffusion
    上次验证: 60 多天前
    listing-photo-e46b5b54080042cf97779da3d0826aab-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2205/e46b5b54080042cf97779da3d0826aab/148013eb81054104a5ec40710dbb2d93_fileutil10_mw.jpg
    listing-photo-e46b5b54080042cf97779da3d0826aab-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2205/e46b5b54080042cf97779da3d0826aab/9068e8bc2992409dbcecc816f81d7045_fileutil_mw.jpg
    listing-photo-e46b5b54080042cf97779da3d0826aab-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2205/e46b5b54080042cf97779da3d0826aab/277e09ea62e7410b9c456f478387872d_fileutil8_mw.jpg
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    listing-photo-e46b5b54080042cf97779da3d0826aab-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2205/e46b5b54080042cf97779da3d0826aab/62b3e803443646fe808af2e37120fd86_fileutil4_mw.jpg
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    51955


    晶圆尺寸:

    12"/300mm


    年份:

    2004


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    FURNACE
    配置
    ALD SiN
    OEM 型号描述
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
    文件

    无文件

    类似上架物品
    查看全部
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