说明
High-Current Implanter (IF106)配置
Ancillary: Abatement Unit, Process Gases: Ar, AsH3, BF3, N2OEM 型号描述
The xR LEAP is the industry’s first sub-keV ion implanter that utilizes patented differential lens technology to achieve beam currents as low as 200eV. This paves the way for ultra-shallow junction development required in advanced 0.18µm and 0.13µm devices. The enhancements built into the xRS Series implanters result in higher throughput, with 235 wafers per hour for 200mm and 220 wafers per hour for 300mm, and lower cost of ownership.文件
无文件
类别
High Current
上次验证： 6 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
142519
晶圆尺寸：
8"/200mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
xR LEAP
类别
High Current
上次验证： 6 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
142519
晶圆尺寸：
8"/200mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
High-Current Implanter (IF106)配置
Ancillary: Abatement Unit, Process Gases: Ar, AsH3, BF3, N2OEM 型号描述
The xR LEAP is the industry’s first sub-keV ion implanter that utilizes patented differential lens technology to achieve beam currents as low as 200eV. This paves the way for ultra-shallow junction development required in advanced 0.18µm and 0.13µm devices. The enhancements built into the xRS Series implanters result in higher throughput, with 235 wafers per hour for 200mm and 220 wafers per hour for 300mm, and lower cost of ownership.文件
无文件