说明

GSD-III 180

配置

See attachment for Ion Implant GSD180 LD: No modification OEM : SEN MODEL : NV-GSD III LED VINTAGE : N/A PROCESS: HIGH CURRENT MOVING TYPE: DISK TYPE DRY PUMP : N/A CRYO PUMP :SUZUKI SHOKAN (SH42) , SUZUKI A200 COMPRESSOR :SUZUKI SHOKAN C305 TMP (TURBO PUMP) : N/A CHILLER : CWA-200L-MP-MP15BCD GAS : ASH3 , PH3 OS : Unix AIX

OEM 型号描述

The SEN CORPORATION / SUMITOMO NV-GSD III-180 is a high-current ion implanter that supports 5, 6, and 8-inch wafers. It has a wide range of implantation energy, from 2 to 180 keV, and is equipped with a post-deflection acceleration mechanism. It has a reliable batch transfer system, high throughput, and accurate high-dose control. The beam quality is high with low metal contamination and cross-contamination. It is also highly reliable and maintainable.- High-Current Ion Implanter - Supports for 5, 6, and 8-inch wafers - Supports for a wide range of implantation energy, from 2 to 180 keV (equipped with a post-deflection acceleration mechanism) - Reliable batch transfer system - Highly effective throughput - Reliable high-dose control accuracy - High beam quality with low metal contamination and low cross-contamination - High reliability, high maintainability