说明
无说明配置
Process Gas:CDA/N2/Ar/ASH3/BF3OEM 型号描述
The SEN CORPORATION / SUMITOMO NV-GSD III-180 is a high-current ion implanter that supports 5, 6, and 8-inch wafers. It has a wide range of implantation energy, from 2 to 180 keV, and is equipped with a post-deflection acceleration mechanism. It has a reliable batch transfer system, high throughput, and accurate high-dose control. The beam quality is high with low metal contamination and cross-contamination. It is also highly reliable and maintainable.- High-Current Ion Implanter - Supports for 5, 6, and 8-inch wafers - Supports for a wide range of implantation energy, from 2 to 180 keV (equipped with a post-deflection acceleration mechanism) - Reliable batch transfer system - Highly effective throughput - Reliable high-dose control accuracy - High beam quality with low metal contamination and low cross-contamination - High reliability, high maintainability文件
无文件
类别
High Current
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
130290
晶圆尺寸：
6"/150mm
年份：
2019
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SEN CORPORATION / SUMITOMO
NV GSD III 180
类别
High Current
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
130290
晶圆尺寸：
6"/150mm
年份：
2019
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Process Gas:CDA/N2/Ar/ASH3/BF3OEM 型号描述
The SEN CORPORATION / SUMITOMO NV-GSD III-180 is a high-current ion implanter that supports 5, 6, and 8-inch wafers. It has a wide range of implantation energy, from 2 to 180 keV, and is equipped with a post-deflection acceleration mechanism. It has a reliable batch transfer system, high throughput, and accurate high-dose control. The beam quality is high with low metal contamination and cross-contamination. It is also highly reliable and maintainable.- High-Current Ion Implanter - Supports for 5, 6, and 8-inch wafers - Supports for a wide range of implantation energy, from 2 to 180 keV (equipped with a post-deflection acceleration mechanism) - Reliable batch transfer system - Highly effective throughput - Reliable high-dose control accuracy - High beam quality with low metal contamination and low cross-contamination - High reliability, high maintainability文件
无文件