We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 阅读更多
说明
Horizontal furnaces, GIGA TECH cleaning machines, and BAKE are excluded.配置
无配置OEM 型号描述
The SEN CORPORATION / SUMITOMO NV-GSD III-180 is a high-current ion implanter that supports 5, 6, and 8-inch wafers. It has a wide range of implantation energy, from 2 to 180 keV, and is equipped with a post-deflection acceleration mechanism. It has a reliable batch transfer system, high throughput, and accurate high-dose control. The beam quality is high with low metal contamination and cross-contamination. It is also highly reliable and maintainable.- High-Current Ion Implanter - Supports for 5, 6, and 8-inch wafers - Supports for a wide range of implantation energy, from 2 to 180 keV (equipped with a post-deflection acceleration mechanism) - Reliable batch transfer system - Highly effective throughput - Reliable high-dose control accuracy - High beam quality with low metal contamination and low cross-contamination - High reliability, high maintainability文件
无文件
类别
High Current
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
124715
晶圆尺寸：
6"/150mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SEN CORPORATION / SUMITOMO
NV GSD III 180
类别
High Current
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
124715
晶圆尺寸：
6"/150mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Horizontal furnaces, GIGA TECH cleaning machines, and BAKE are excluded.配置
无配置OEM 型号描述
The SEN CORPORATION / SUMITOMO NV-GSD III-180 is a high-current ion implanter that supports 5, 6, and 8-inch wafers. It has a wide range of implantation energy, from 2 to 180 keV, and is equipped with a post-deflection acceleration mechanism. It has a reliable batch transfer system, high throughput, and accurate high-dose control. The beam quality is high with low metal contamination and cross-contamination. It is also highly reliable and maintainable.- High-Current Ion Implanter - Supports for 5, 6, and 8-inch wafers - Supports for a wide range of implantation energy, from 2 to 180 keV (equipped with a post-deflection acceleration mechanism) - Reliable batch transfer system - Highly effective throughput - Reliable high-dose control accuracy - High beam quality with low metal contamination and low cross-contamination - High reliability, high maintainability文件
无文件