说明
implanter配置
Dosage range (actual dose: 10¹⁰～10¹⁴ ions/cm²), beam current (～500μA). * Throughput: ≥100 ions/h (6in)OEM 型号描述
The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.文件
无文件
类似上架物品
查看全部
ULVAC
SOPHI-200
类别
Medium Current
上次验证： 10 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
139233
晶圆尺寸：
6"/150mm
年份：
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
implanter配置
Dosage range (actual dose: 10¹⁰～10¹⁴ ions/cm²), beam current (～500μA). * Throughput: ≥100 ions/h (6in)OEM 型号描述
The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.文件
无文件