说明
Ion implant配置
无配置OEM 型号描述
The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.文件
无文件
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ULVAC
SOPHI-200
类别
Medium Current
上次验证： 今天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
148504
晶圆尺寸：
未知
年份：
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Ion implant配置
无配置OEM 型号描述
The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.文件
无文件