说明
无说明配置
无配置OEM 型号描述
The MRC 603 is a sputter system designed to deposit thin film metals by DC source. It can hold four 6-inch wafers on a pallet for the process. The tool can be used to deposit aluminum (Al), titanium (Ti), and indium-tin-oxide (ITO) for single or multi-stack films like an Al/Ti文件
无文件
MRC / KDF
603
已验证
类别
PVD / Sputtering
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
111351
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
MRC / KDF
603
类别
PVD / Sputtering
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
111351
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
无配置OEM 型号描述
The MRC 603 is a sputter system designed to deposit thin film metals by DC source. It can hold four 6-inch wafers on a pallet for the process. The tool can be used to deposit aluminum (Al), titanium (Ti), and indium-tin-oxide (ITO) for single or multi-stack films like an Al/Ti文件
无文件