说明
PC controller New PCBs配置
无配置OEM 型号描述
The MRC 603 is a sputter system designed to deposit thin film metals by DC source. It can hold four 6-inch wafers on a pallet for the process. The tool can be used to deposit aluminum (Al), titanium (Ti), and indium-tin-oxide (ITO) for single or multi-stack films like an Al/Ti文件
无文件
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KDF / MRC
603
类别
PVD / Sputtering
上次验证： 9 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
138420
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
PC controller New PCBs配置
无配置OEM 型号描述
The MRC 603 is a sputter system designed to deposit thin film metals by DC source. It can hold four 6-inch wafers on a pallet for the process. The tool can be used to deposit aluminum (Al), titanium (Ti), and indium-tin-oxide (ITO) for single or multi-stack films like an Al/Ti文件
无文件