说明

Photolithography 248nm Scanner HDD is not included. Excluded Items List(Pumps,Chillers & Abatement are all excluded)

配置

System Type Description Quantity Factory Interface Open Cassette 1 Main System NSR S204B 1 Handler System WL Type 3 1 S204B Lens Data from 2Q 2024 before idling: IU Flare = 1.54% Lens Flare = 8.20% Uniformity = 2.09% Power = 497 mW/cm2 Total Focus Deviation = 0.142 µm Astigmatism = 0.092 µm Coma = 0.063 µm Iso DOF = .331 µm

OEM 型号描述

The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.