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KLA AIT I
    说明
    无说明
    配置
    Patterned Wafer inspectiom
    OEM 型号描述
    The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
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    KLA

    AIT I

    verified-listing-icon

    已验证

    类别

    Defect Inspection
    上次验证: 30 多天前
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    99712


    晶圆尺寸:

    8"/200mm


    年份:

    1999

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    Logistics Support
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    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
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    KLA AIT I
    KLAAIT IDefect Inspection
    年份: 1999状况: 二手
    上次验证30 多天前

    KLA

    AIT I

    verified-listing-icon

    已验证

    类别

    Defect Inspection
    上次验证: 30 多天前
    listing-photo-35c04d95ac1e4d97bc69e88a5b5e5a6e-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    99712


    晶圆尺寸:

    8"/200mm


    年份:

    1999


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    Patterned Wafer inspectiom
    OEM 型号描述
    The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
    文件

    无文件

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    查看全部
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