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KLA CANDELA CS20
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The Candela CS20 system measures surface reflectivity and topography for automatic defect detection and classification. It uses scatterometry, ellipsometry, reflectometry, and topographical analysis to inspect wafer surfaces for defects and film thickness uniformity. It is designed for inspection of transparent materials such as sapphire and GaN and can detect a wide variety of defects. It is suitable for use in the production of High Brightness Light Emitting Diodes (HBLEDs), High-Power RF Devices, and Coated Glass (CMOS imagers, LCoS chips, etc.).
    文件

    无文件

    KLA

    CANDELA CS20

    verified-listing-icon

    已验证

    类别
    Defect Inspection

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Refurbished


    运行状况:

    未知


    产品编号:

    85052


    晶圆尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    KLA CANDELA CS20

    KLA

    CANDELA CS20

    Defect Inspection
    年份: 2006状况: 二手
    上次验证30 多天前

    KLA

    CANDELA CS20

    verified-listing-icon
    已验证
    类别
    Defect Inspection
    上次验证: 60 多天前
    listing-photo-37affdd90b204b51ac7340f14665a833-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Refurbished


    运行状况:

    未知


    产品编号:

    85052


    晶圆尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The Candela CS20 system measures surface reflectivity and topography for automatic defect detection and classification. It uses scatterometry, ellipsometry, reflectometry, and topographical analysis to inspect wafer surfaces for defects and film thickness uniformity. It is designed for inspection of transparent materials such as sapphire and GaN and can detect a wide variety of defects. It is suitable for use in the production of High Brightness Light Emitting Diodes (HBLEDs), High-Power RF Devices, and Coated Glass (CMOS imagers, LCoS chips, etc.).
    文件

    无文件

    类似上架物品
    查看全部
    KLA CANDELA CS20

    KLA

    CANDELA CS20

    Defect Inspection年份: 2006状况: 二手上次验证:30 多天前
    KLA CANDELA CS20

    KLA

    CANDELA CS20

    Defect Inspection年份: 2006状况: 二手上次验证:30 多天前
    KLA CANDELA CS20

    KLA

    CANDELA CS20

    Defect Inspection年份: 2006状况: 二手上次验证:60 多天前