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说明
ETCH配置
3CHOEM 型号描述
The TEL (Tokyo Electron) Trias SPA is a single-wafer plasma processing system designed for semiconductor manufacturing. It utilizes Tokyo Electron's Slot Plane Antenna (SPA) technology to generate high-density, low-electron-temperature plasma, enabling low-damage, low-temperature plasma treatments. This system is particularly suited for critical front-end-of-line (FEOL) applications, including gate nitridation, gate recovery oxidation, and shallow trench isolation (STI) liner oxidation.文件
无文件
类别
Deposition
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
75752
晶圆尺寸：
12"/300mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
TRIAS SPA
类别
Deposition
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
75752
晶圆尺寸：
12"/300mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
ETCH配置
3CHOEM 型号描述
The TEL (Tokyo Electron) Trias SPA is a single-wafer plasma processing system designed for semiconductor manufacturing. It utilizes Tokyo Electron's Slot Plane Antenna (SPA) technology to generate high-density, low-electron-temperature plasma, enabling low-damage, low-temperature plasma treatments. This system is particularly suited for critical front-end-of-line (FEOL) applications, including gate nitridation, gate recovery oxidation, and shallow trench isolation (STI) liner oxidation.文件
无文件