说明
Including: Leybold D40BCS, Neslab HX75 Chiller, Manuals. Gases Used: Ar, SF6, N2, O2配置
无配置OEM 型号描述
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.文件
无文件
类别
Dry / Plasma Etch
上次验证： 7 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
138675
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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PLASMATHERM
790
类别
Dry / Plasma Etch
上次验证： 7 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
138675
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Including: Leybold D40BCS, Neslab HX75 Chiller, Manuals. Gases Used: Ar, SF6, N2, O2配置
无配置OEM 型号描述
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.文件
无文件