
说明
无说明配置
GSD 200E2 high current 90keV Non-HPES handler SMIF Software: 6.4.4 SECS Missing: LPT2200 Roughing Pump x2 Cryo Pump x2 Disk Chiller Source Turbo PumpOEM 型号描述
The GSD/200E2 is a 200mm standard high current implanter with a maximum energy of 180KeV. It offers reliable, high productivity and exceptional product control with unmatched cost of ownership. It meets advanced manufacturing requirements through the 180nm node and maintains high throughput for quad implants used for trench doping. It features an Extended Life Source, a Xenon-based Plasma Electron Flood, and real-time dose control for consistent low doses.文件
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GSD 200E2
类别
High Current
上次验证: 12 天前
物品主要详细信息
状况:
Used
运行状况:
Installed / Running
产品编号:
149514
晶圆尺寸:
8"/200mm
年份:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
GSD 200E2 high current 90keV Non-HPES handler SMIF Software: 6.4.4 SECS Missing: LPT2200 Roughing Pump x2 Cryo Pump x2 Disk Chiller Source Turbo PumpOEM 型号描述
The GSD/200E2 is a 200mm standard high current implanter with a maximum energy of 180KeV. It offers reliable, high productivity and exceptional product control with unmatched cost of ownership. It meets advanced manufacturing requirements through the 180nm node and maintains high throughput for quad implants used for trench doping. It features an Extended Life Source, a Xenon-based Plasma Electron Flood, and real-time dose control for consistent low doses.文件
无文件