说明
Axcelis HC GSD 200mm Software Version: VM (Virtual Machine) 8.0 CIM: SECS Process: HC Implant (B11, BF2, As and P) No Pumps, Chillers & Abatement 1 Blade Server配置
Handler System: ARM (Non HPES) Factory Interface: None Handler System Holder: (Non HPES) Options System: Silicon Disk Options System: SEF EGUN Main System: Axcelis GSD 200 E2 Handling System: In air HandlerOEM 型号描述
The GSD/200E2 is a 200mm standard high current implanter with a maximum energy of 180KeV. It offers reliable, high productivity and exceptional product control with unmatched cost of ownership. It meets advanced manufacturing requirements through the 180nm node and maintains high throughput for quad implants used for trench doping. It features an Extended Life Source, a Xenon-based Plasma Electron Flood, and real-time dose control for consistent low doses.文件
无文件
AXCELIS
GSD 200E2
类别
High Current
上次验证： 6 天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Down
产品编号：
146005
晶圆尺寸：
8"/200mm
年份：
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Axcelis HC GSD 200mm Software Version: VM (Virtual Machine) 8.0 CIM: SECS Process: HC Implant (B11, BF2, As and P) No Pumps, Chillers & Abatement 1 Blade Server配置
Handler System: ARM (Non HPES) Factory Interface: None Handler System Holder: (Non HPES) Options System: Silicon Disk Options System: SEF EGUN Main System: Axcelis GSD 200 E2 Handling System: In air HandlerOEM 型号描述
The GSD/200E2 is a 200mm standard high current implanter with a maximum energy of 180KeV. It offers reliable, high productivity and exceptional product control with unmatched cost of ownership. It meets advanced manufacturing requirements through the 180nm node and maintains high throughput for quad implants used for trench doping. It features an Extended Life Source, a Xenon-based Plasma Electron Flood, and real-time dose control for consistent low doses.文件
无文件