说明

Photolithography Scanner 248nm Handler System - WL Type 3 Interface - Open Cassette

配置

Software Version - MCSV CIM - SECS Process - Photolithography

OEM 型号描述

The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.